Vacuum-free plasma and electrochemical surface preparation
Stage: Pilot production use
Classic plasma processing methods require vacuum chambers — expensive, slow and limiting in sample size. We are refining treatment with atmospheric plasma: the same surface cleaning and activation, but without vacuum.
Paired with electrochemical polishing, the method yields a surface with Ra 0.1–0.4 µm roughness and no cold work or deformed layer — the structure under the microscope is seen as it truly is. Process parameter stability is 5–10 %.
Development direction: extending the range of alloys and selecting electrolytes for non-standard materials.