PL-Plasma-EChemSurfPrep Plasma and Electrochemical Surface Preparation System

Equipment

The system performs plasma activation, electrochemical polishing and etching of metallographic sample surfaces — preparation for the subsequent stages of microstructure analysis. Processing runs under atmospheric conditions, without vacuum technology.

It comprises the PL-ColdPlasmaCleaner-1.5 plasma cleaning and surface activation unit and the PL-EChemSurfPrep electrochemical polishing and etching unit. Process parameter stability is 5–10 %.

PLASMA PROCESSING — PL-ColdPlasmaCleaner-1.5

power supply 380 V AC, 50 Hz, 3-phase

Plasma type

atmospheric; working gases Air / Ar / N₂ / O₂

Plasma working voltage

0.5–2.5 kV

Plasma working current

0.05–2 A

Power

up to 1.5 kW

Generator frequency

10–30 kHz

Plasma gas pressure

0.20–0.28 MPa

ELECTROCHEMICAL PROCESSING — PL-EChemSurfPrep

power supply 220 V AC, 50 Hz

Output voltage

DC 0–100 V

Working voltage

up to 15–20 V DC

Maximum current

up to 6–20 A

Measurement accuracy

voltage 0.01 V, current 0.001 A

Electrolyte type

standard aqueous electrolytes for Al, Fe, Ni alloys

Control type

microcontroller or basic PLC

Surface roughness after processing

Ra 0.1–0.4 µm

Part of the complex: PL-MetCore Full-Cycle Metallographic Complex

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Technology used

Plasma Cleaning and Surface Activation More details →

Electrochemical Polishing and Etching More details →